SIMILARITIES IN CHEMICAL INTERMIXING AT THE CU/INP AND CU/SI INTERFACES

被引：30
作者：
KENDELEWICZ, T
ROSSI, G
PETRO, WG
BABALOLA, IA
LINDAU, I
SPICER, WE
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1983年 / 1卷 / 03期
关键词：
D O I：
10.1116/1.582599
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：564 / 569
页数：6
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