COMPUTER-AIDED PROCEDURE FOR OPTIMIZATION OF LAYER THICKNESS UNIFORMITY IN THERMAL EVAPORATION PHYSICAL VAPOR-DEPOSITION CHAMBERS FOR LENS COATING

被引：7

作者：

BOSCH, S

机构：

[1] Departament de Fisica Aplicada i Electrònica, Universitat de Barcelona, 08028, Barcelona

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1992年 / 10卷 / 01期

关键词：

D O I：

10.1116/1.578073

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

A computer-aided method to improve the thickness uniformity attainable when coating multiple substrates inside a thermal evaporation physical vapor deposition unit is presented. The study is developed for the classical spherical (dome-shaped) calotte and also for a plane sector reversible holder setup. This second arrangement is very useful for coating both sides of the substrate, such as antireflection multilayers on lenses. The design of static correcting shutters for both kinds of configurations is also discussed. Some results of using the method are presented as an illustration.

引用

页码：98 / 104

页数：7