MODELING OF LOW-PRESSURE CVD PROCESSES

被引：64
作者：
KUIPER, AET
VANDENBREKEL, CJH
DEGROOT, J
VELTKAMP, GW
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1982年 / 129卷 / 10期
关键词：
D O I：
10.1149/1.2123495
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：2288 / 2291
页数：4
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