DOWNWARD LASER TRIMMING OF THICK-FILM RESISTORS

被引:3
作者
NARAYANA, TB
RAMKUMAR, K
SATYAM, M
机构
[1] Department of Electrical Communication Engineering, Indian Institute of Science
来源
IEEE TRANSACTIONS ON COMPONENTS HYBRIDS AND MANUFACTURING TECHNOLOGY | 1991年 / 14卷 / 04期
关键词
D O I
10.1109/33.105151
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In this paper a method of laser trimming thick film resistors to lower resistance, that is downwards, is suggested. It involves heating of certain regions of the resistor film in the form of tracks (to a temperature where certain transformation in the structure of the film takes place, like segregation of the constituents of the resistor material, but not high enough to evaporate the material) by the use of a laser beam of appropriate power density. The heated regions are found to become regions of very high electrical conductivity. It has been found that trimming tracks made perpendicular to the current flow direction are not effective in reducing the resistance. On the other hand, trimming tracks made along the direction of the current flow are found to be effective in decreasing the value of the resistance. It has also been found that the resistance decreases with an increase in length and width of the track. This paper provides data from computer simulations and measurements made on analog resistor networks that enable one to design trimming tracks.
引用
收藏
页码:894 / 899
页数:6
相关论文
共 6 条
[1]  
ALBIN AG, 1971, IEEE P ELECTRONIC CO, P38
[2]  
HEADELY RC, 1973, IEEE P ELECTR COMPON, P47
[3]  
HEADLEY RC, 1973, ELECTRON, V21, P121
[4]  
HOFUKU E, 1989, J APPL PHYS, V66, P6126
[5]   INTRODUCTION TO THICK-FILM RESISTOR TRIMMING BY LASER [J].
OAKES, M .
OPTICAL ENGINEERING, 1978, 17 (03) :217-224
[6]  
SATYAM M, 1972, ELECTRON DEVICES PHY, P21