HIGH-TC SUPERCONDUCTING THIN-FILM FABRICATION BY MODIFIED DC SPUTTERING PROCESS

被引：11
|
作者：
LIN, RJ
KUNG, JH
WU, PT
机构：
来源：
PHYSICA C | 1988年 / 153卷
关键词：
D O I：
10.1016/S0921-4534(88)80093-5
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：796 / 797
页数：2
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