OBSERVATION OF HSICL IN A CHEMICAL VAPOR-DEPOSITION REACTOR BY LASER-EXCITED FLUORESCENCE

被引：52

作者：

HO, P

BREILAND, WG

机构：

来源：

APPLIED PHYSICS LETTERS | 1983年 / 43卷 / 01期

关键词：

D O I：

10.1063/1.94141

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：125 / 126

页数：2

共 17 条

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