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KRF FAST DISCHARGE LASER IN MIXTURES CONTAINING NF3, N2F4 OR SF6
被引:38
作者
:
ANDREWS, AJ
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV OXFORD,CLARENDON LAB,DEPT PHYS,OXFORD,ENGLAND
ANDREWS, AJ
KEARSLEY, AJ
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV OXFORD,CLARENDON LAB,DEPT PHYS,OXFORD,ENGLAND
KEARSLEY, AJ
WEBB, CE
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV OXFORD,CLARENDON LAB,DEPT PHYS,OXFORD,ENGLAND
WEBB, CE
HAYDON, SC
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV OXFORD,CLARENDON LAB,DEPT PHYS,OXFORD,ENGLAND
HAYDON, SC
机构
:
[1]
UNIV OXFORD,CLARENDON LAB,DEPT PHYS,OXFORD,ENGLAND
[2]
UNIV NEW ENGLAND,DEPT PHYS,ARMIDALE 2351,NEW S WALES,AUSTRALIA
来源
:
OPTICS COMMUNICATIONS
|
1977年
/ 20卷
/ 02期
关键词
:
D O I
:
10.1016/0030-4018(77)90348-0
中图分类号
:
O43 [光学];
学科分类号
:
070207 ;
0803 ;
摘要
:
引用
收藏
页码:265 / 268
页数:4
相关论文
共 10 条
[1]
HIGH-EFFICIENCY KRF EXCIMER LASER
[J].
BHAUMIK, ML
论文数:
0
引用数:
0
h-index:
0
机构:
NORTHROP RES & TECHNOL CTR,HAWTHORNE,CA 90250
NORTHROP RES & TECHNOL CTR,HAWTHORNE,CA 90250
BHAUMIK, ML
;
BRADFORD, RS
论文数:
0
引用数:
0
h-index:
0
机构:
NORTHROP RES & TECHNOL CTR,HAWTHORNE,CA 90250
NORTHROP RES & TECHNOL CTR,HAWTHORNE,CA 90250
BRADFORD, RS
;
AULT, ER
论文数:
0
引用数:
0
h-index:
0
机构:
NORTHROP RES & TECHNOL CTR,HAWTHORNE,CA 90250
NORTHROP RES & TECHNOL CTR,HAWTHORNE,CA 90250
AULT, ER
.
APPLIED PHYSICS LETTERS,
1976,
28
(01)
:23
-24
[2]
HIGH-EFFICIENCY DISCHARGE EXCITATION OF KRF LASER
[J].
BRADFORD, RS
论文数:
0
引用数:
0
h-index:
0
机构:
NOTHROP CORP,RES & TECHNOL CTR,HAWTHORNE,CA 90250
NOTHROP CORP,RES & TECHNOL CTR,HAWTHORNE,CA 90250
BRADFORD, RS
;
LACINA, WB
论文数:
0
引用数:
0
h-index:
0
机构:
NOTHROP CORP,RES & TECHNOL CTR,HAWTHORNE,CA 90250
NOTHROP CORP,RES & TECHNOL CTR,HAWTHORNE,CA 90250
LACINA, WB
;
AULT, ER
论文数:
0
引用数:
0
h-index:
0
机构:
NOTHROP CORP,RES & TECHNOL CTR,HAWTHORNE,CA 90250
NOTHROP CORP,RES & TECHNOL CTR,HAWTHORNE,CA 90250
AULT, ER
;
BHAUMIK, ML
论文数:
0
引用数:
0
h-index:
0
机构:
NOTHROP CORP,RES & TECHNOL CTR,HAWTHORNE,CA 90250
NOTHROP CORP,RES & TECHNOL CTR,HAWTHORNE,CA 90250
BHAUMIK, ML
.
OPTICS COMMUNICATIONS,
1976,
18
(02)
:210
-211
[3]
EFFICIENT ELECTRIC-DISCHARGE LASERS IN XEF AND KRF
[J].
BURNHAM, R
论文数:
0
引用数:
0
h-index:
0
机构:
CATHOLIC UNIV AMER, WASHINGTON, DC 20017 USA
BURNHAM, R
;
POWELL, FX
论文数:
0
引用数:
0
h-index:
0
机构:
CATHOLIC UNIV AMER, WASHINGTON, DC 20017 USA
POWELL, FX
;
DJEU, N
论文数:
0
引用数:
0
h-index:
0
机构:
CATHOLIC UNIV AMER, WASHINGTON, DC 20017 USA
DJEU, N
.
APPLIED PHYSICS LETTERS,
1976,
29
(01)
:30
-32
[4]
LASER ACTION ON SIGMA-2+1-2 -] SIGMA-2+1-2 BANDS OF KRF AND XECL
[J].
EWING, JJ
论文数:
0
引用数:
0
h-index:
0
机构:
AVCO EVERETT RES LAB INC,EVERETT,MA 02149
AVCO EVERETT RES LAB INC,EVERETT,MA 02149
EWING, JJ
;
BRAU, CA
论文数:
0
引用数:
0
h-index:
0
机构:
AVCO EVERETT RES LAB INC,EVERETT,MA 02149
AVCO EVERETT RES LAB INC,EVERETT,MA 02149
BRAU, CA
.
APPLIED PHYSICS LETTERS,
1975,
27
(06)
:350
-352
[5]
COMPACT EFFICIENT DISCHARGE LASERS IN XEF, KRF AND FLUORINE
[J].
GODARD, B
论文数:
0
引用数:
0
h-index:
0
机构:
CO GEN ELECT,DIV LASERS,MARCOUSSIS,FRANCE
CO GEN ELECT,DIV LASERS,MARCOUSSIS,FRANCE
GODARD, B
;
VANNIER, M
论文数:
0
引用数:
0
h-index:
0
机构:
CO GEN ELECT,DIV LASERS,MARCOUSSIS,FRANCE
CO GEN ELECT,DIV LASERS,MARCOUSSIS,FRANCE
VANNIER, M
.
OPTICS COMMUNICATIONS,
1976,
18
(02)
:206
-207
[6]
HIGH-POWER UV NOBLE-GAS-HALIDE LASERS
[J].
HOFFMAN, JM
论文数:
0
引用数:
0
h-index:
0
机构:
SANDIA LABS,ALBUQUERQUE,NM 87115
SANDIA LABS,ALBUQUERQUE,NM 87115
HOFFMAN, JM
;
HAYS, AK
论文数:
0
引用数:
0
h-index:
0
机构:
SANDIA LABS,ALBUQUERQUE,NM 87115
SANDIA LABS,ALBUQUERQUE,NM 87115
HAYS, AK
;
TISONE, GC
论文数:
0
引用数:
0
h-index:
0
机构:
SANDIA LABS,ALBUQUERQUE,NM 87115
SANDIA LABS,ALBUQUERQUE,NM 87115
TISONE, GC
.
APPLIED PHYSICS LETTERS,
1976,
28
(09)
:538
-539
[7]
ELECTRON-BEAM-CONTROLLED DISCHARGE PUMPING OF KRF LASER
[J].
MANGANO, JA
论文数:
0
引用数:
0
h-index:
0
机构:
AVCO EVERETT RES LAB,EVERETT,MA 02149
AVCO EVERETT RES LAB,EVERETT,MA 02149
MANGANO, JA
;
JACOB, JH
论文数:
0
引用数:
0
h-index:
0
机构:
AVCO EVERETT RES LAB,EVERETT,MA 02149
AVCO EVERETT RES LAB,EVERETT,MA 02149
JACOB, JH
.
APPLIED PHYSICS LETTERS,
1975,
27
(09)
:495
-498
[8]
FAST-DISCHARGE-INITIATED KRF LASER
[J].
SUTTON, DG
论文数:
0
引用数:
0
h-index:
0
机构:
AEROSP CORP,EL SEGUNDO,CA 90245
AEROSP CORP,EL SEGUNDO,CA 90245
SUTTON, DG
;
SUCHARD, SN
论文数:
0
引用数:
0
h-index:
0
机构:
AEROSP CORP,EL SEGUNDO,CA 90245
AEROSP CORP,EL SEGUNDO,CA 90245
SUCHARD, SN
;
GIBB, OL
论文数:
0
引用数:
0
h-index:
0
机构:
AEROSP CORP,EL SEGUNDO,CA 90245
AEROSP CORP,EL SEGUNDO,CA 90245
GIBB, OL
;
WANG, CP
论文数:
0
引用数:
0
h-index:
0
机构:
AEROSP CORP,EL SEGUNDO,CA 90245
AEROSP CORP,EL SEGUNDO,CA 90245
WANG, CP
.
APPLIED PHYSICS LETTERS,
1976,
28
(09)
:522
-523
[9]
100 MW, 248.4 NM, KRF LASER-EXCITED BY AN ELECTRON-BEAM
[J].
TISONE, GC
论文数:
0
引用数:
0
h-index:
0
机构:
SANDIA LABS,ALBUQUERQUE,NM 87115
SANDIA LABS,ALBUQUERQUE,NM 87115
TISONE, GC
;
HAYS, AK
论文数:
0
引用数:
0
h-index:
0
机构:
SANDIA LABS,ALBUQUERQUE,NM 87115
SANDIA LABS,ALBUQUERQUE,NM 87115
HAYS, AK
;
HOFFMAN, JM
论文数:
0
引用数:
0
h-index:
0
机构:
SANDIA LABS,ALBUQUERQUE,NM 87115
SANDIA LABS,ALBUQUERQUE,NM 87115
HOFFMAN, JM
.
OPTICS COMMUNICATIONS,
1975,
15
(02)
:188
-189
[10]
WANG CP, 1976, APPL PHYS LETT, V29, P103, DOI 10.1063/1.88985
←
1
→
共 10 条
[1]
HIGH-EFFICIENCY KRF EXCIMER LASER
[J].
BHAUMIK, ML
论文数:
0
引用数:
0
h-index:
0
机构:
NORTHROP RES & TECHNOL CTR,HAWTHORNE,CA 90250
NORTHROP RES & TECHNOL CTR,HAWTHORNE,CA 90250
BHAUMIK, ML
;
BRADFORD, RS
论文数:
0
引用数:
0
h-index:
0
机构:
NORTHROP RES & TECHNOL CTR,HAWTHORNE,CA 90250
NORTHROP RES & TECHNOL CTR,HAWTHORNE,CA 90250
BRADFORD, RS
;
AULT, ER
论文数:
0
引用数:
0
h-index:
0
机构:
NORTHROP RES & TECHNOL CTR,HAWTHORNE,CA 90250
NORTHROP RES & TECHNOL CTR,HAWTHORNE,CA 90250
AULT, ER
.
APPLIED PHYSICS LETTERS,
1976,
28
(01)
:23
-24
[2]
HIGH-EFFICIENCY DISCHARGE EXCITATION OF KRF LASER
[J].
BRADFORD, RS
论文数:
0
引用数:
0
h-index:
0
机构:
NOTHROP CORP,RES & TECHNOL CTR,HAWTHORNE,CA 90250
NOTHROP CORP,RES & TECHNOL CTR,HAWTHORNE,CA 90250
BRADFORD, RS
;
LACINA, WB
论文数:
0
引用数:
0
h-index:
0
机构:
NOTHROP CORP,RES & TECHNOL CTR,HAWTHORNE,CA 90250
NOTHROP CORP,RES & TECHNOL CTR,HAWTHORNE,CA 90250
LACINA, WB
;
AULT, ER
论文数:
0
引用数:
0
h-index:
0
机构:
NOTHROP CORP,RES & TECHNOL CTR,HAWTHORNE,CA 90250
NOTHROP CORP,RES & TECHNOL CTR,HAWTHORNE,CA 90250
AULT, ER
;
BHAUMIK, ML
论文数:
0
引用数:
0
h-index:
0
机构:
NOTHROP CORP,RES & TECHNOL CTR,HAWTHORNE,CA 90250
NOTHROP CORP,RES & TECHNOL CTR,HAWTHORNE,CA 90250
BHAUMIK, ML
.
OPTICS COMMUNICATIONS,
1976,
18
(02)
:210
-211
[3]
EFFICIENT ELECTRIC-DISCHARGE LASERS IN XEF AND KRF
[J].
BURNHAM, R
论文数:
0
引用数:
0
h-index:
0
机构:
CATHOLIC UNIV AMER, WASHINGTON, DC 20017 USA
BURNHAM, R
;
POWELL, FX
论文数:
0
引用数:
0
h-index:
0
机构:
CATHOLIC UNIV AMER, WASHINGTON, DC 20017 USA
POWELL, FX
;
DJEU, N
论文数:
0
引用数:
0
h-index:
0
机构:
CATHOLIC UNIV AMER, WASHINGTON, DC 20017 USA
DJEU, N
.
APPLIED PHYSICS LETTERS,
1976,
29
(01)
:30
-32
[4]
LASER ACTION ON SIGMA-2+1-2 -] SIGMA-2+1-2 BANDS OF KRF AND XECL
[J].
EWING, JJ
论文数:
0
引用数:
0
h-index:
0
机构:
AVCO EVERETT RES LAB INC,EVERETT,MA 02149
AVCO EVERETT RES LAB INC,EVERETT,MA 02149
EWING, JJ
;
BRAU, CA
论文数:
0
引用数:
0
h-index:
0
机构:
AVCO EVERETT RES LAB INC,EVERETT,MA 02149
AVCO EVERETT RES LAB INC,EVERETT,MA 02149
BRAU, CA
.
APPLIED PHYSICS LETTERS,
1975,
27
(06)
:350
-352
[5]
COMPACT EFFICIENT DISCHARGE LASERS IN XEF, KRF AND FLUORINE
[J].
GODARD, B
论文数:
0
引用数:
0
h-index:
0
机构:
CO GEN ELECT,DIV LASERS,MARCOUSSIS,FRANCE
CO GEN ELECT,DIV LASERS,MARCOUSSIS,FRANCE
GODARD, B
;
VANNIER, M
论文数:
0
引用数:
0
h-index:
0
机构:
CO GEN ELECT,DIV LASERS,MARCOUSSIS,FRANCE
CO GEN ELECT,DIV LASERS,MARCOUSSIS,FRANCE
VANNIER, M
.
OPTICS COMMUNICATIONS,
1976,
18
(02)
:206
-207
[6]
HIGH-POWER UV NOBLE-GAS-HALIDE LASERS
[J].
HOFFMAN, JM
论文数:
0
引用数:
0
h-index:
0
机构:
SANDIA LABS,ALBUQUERQUE,NM 87115
SANDIA LABS,ALBUQUERQUE,NM 87115
HOFFMAN, JM
;
HAYS, AK
论文数:
0
引用数:
0
h-index:
0
机构:
SANDIA LABS,ALBUQUERQUE,NM 87115
SANDIA LABS,ALBUQUERQUE,NM 87115
HAYS, AK
;
TISONE, GC
论文数:
0
引用数:
0
h-index:
0
机构:
SANDIA LABS,ALBUQUERQUE,NM 87115
SANDIA LABS,ALBUQUERQUE,NM 87115
TISONE, GC
.
APPLIED PHYSICS LETTERS,
1976,
28
(09)
:538
-539
[7]
ELECTRON-BEAM-CONTROLLED DISCHARGE PUMPING OF KRF LASER
[J].
MANGANO, JA
论文数:
0
引用数:
0
h-index:
0
机构:
AVCO EVERETT RES LAB,EVERETT,MA 02149
AVCO EVERETT RES LAB,EVERETT,MA 02149
MANGANO, JA
;
JACOB, JH
论文数:
0
引用数:
0
h-index:
0
机构:
AVCO EVERETT RES LAB,EVERETT,MA 02149
AVCO EVERETT RES LAB,EVERETT,MA 02149
JACOB, JH
.
APPLIED PHYSICS LETTERS,
1975,
27
(09)
:495
-498
[8]
FAST-DISCHARGE-INITIATED KRF LASER
[J].
SUTTON, DG
论文数:
0
引用数:
0
h-index:
0
机构:
AEROSP CORP,EL SEGUNDO,CA 90245
AEROSP CORP,EL SEGUNDO,CA 90245
SUTTON, DG
;
SUCHARD, SN
论文数:
0
引用数:
0
h-index:
0
机构:
AEROSP CORP,EL SEGUNDO,CA 90245
AEROSP CORP,EL SEGUNDO,CA 90245
SUCHARD, SN
;
GIBB, OL
论文数:
0
引用数:
0
h-index:
0
机构:
AEROSP CORP,EL SEGUNDO,CA 90245
AEROSP CORP,EL SEGUNDO,CA 90245
GIBB, OL
;
WANG, CP
论文数:
0
引用数:
0
h-index:
0
机构:
AEROSP CORP,EL SEGUNDO,CA 90245
AEROSP CORP,EL SEGUNDO,CA 90245
WANG, CP
.
APPLIED PHYSICS LETTERS,
1976,
28
(09)
:522
-523
[9]
100 MW, 248.4 NM, KRF LASER-EXCITED BY AN ELECTRON-BEAM
[J].
TISONE, GC
论文数:
0
引用数:
0
h-index:
0
机构:
SANDIA LABS,ALBUQUERQUE,NM 87115
SANDIA LABS,ALBUQUERQUE,NM 87115
TISONE, GC
;
HAYS, AK
论文数:
0
引用数:
0
h-index:
0
机构:
SANDIA LABS,ALBUQUERQUE,NM 87115
SANDIA LABS,ALBUQUERQUE,NM 87115
HAYS, AK
;
HOFFMAN, JM
论文数:
0
引用数:
0
h-index:
0
机构:
SANDIA LABS,ALBUQUERQUE,NM 87115
SANDIA LABS,ALBUQUERQUE,NM 87115
HOFFMAN, JM
.
OPTICS COMMUNICATIONS,
1975,
15
(02)
:188
-189
[10]
WANG CP, 1976, APPL PHYS LETT, V29, P103, DOI 10.1063/1.88985
←
1
→