DIFFUSION SUPPRESSION OF PHOTOLYTIC FRAGMENTS ON LASER-INDUCED CHEMICAL VAPOR-DEPOSITION

被引：3

作者：

ARAI, Y

YAMAGUCHI, S

OHSAKI, T

机构：

来源：

APPLIED PHYSICS LETTERS | 1988年 / 52卷 / 24期

关键词：

D O I：

10.1063/1.99581

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：2083 / 2085

页数：3

相关论文

共 10 条

[1] LOW-TEMPERATURE GROWTH OF POLYCRYSTALLINE SI AND GE FILMS BY ULTRAVIOLET-LASER PHOTO-DISSOCIATION OF SILANE AND GERMANE
ANDREATTA, RW
ABELE, CC
OSMUNDSEN, JF
EDEN, JG
LUBBEN, D
GREENE, JE
[J]. APPLIED PHYSICS LETTERS, 1982, 40 (02) : 183 - 185
[2] LASER CHEMICAL VAPOR-DEPOSITION OF GOLD
BAUM, TH
JONES, CR
[J]. APPLIED PHYSICS LETTERS, 1985, 47 (05) : 538 - 540
[3] VACUUM ULTRAVIOLET DRIVEN CHEMICAL VAPOR-DEPOSITION OF LOCALIZED ALUMINUM THIN-FILMS
CALLOWAY, AR
GALANTOWICZ, TA
FENNER, WR
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1983, 1 (02): : 534 - 536
[4] LASER PHOTODEPOSITION OF METAL-FILMS WITH MICROSCOPIC FEATURES
DEUTSCH, TF
EHRLICH, DJ
OSGOOD, RM
[J]. APPLIED PHYSICS LETTERS, 1979, 35 (02) : 175 - 177
[5] PHOTODEPOSITION OF METAL-FILMS WITH ULTRAVIOLET-LASER LIGHT
EHRLICH, DJ
OSGOOD, RM
DEUTSCH, TF
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 21 (01): : 23 - 32
[6] SPATIALLY DELINEATED GROWTH OF METAL-FILMS VIA PHOTOCHEMICAL PRE-NUCLEATION
EHRLICH, DJ
OSGOOD, RM
DEUTSCH, TF
[J]. APPLIED PHYSICS LETTERS, 1981, 38 (11) : 946 - 948
[7] COLUMN-IIIA METAL-FILM DEPOSITION BY DISSOCIATIVE PHOTOIONIZATION OF METAL HALIDE VAPORS
GEOHEGAN, DB
EDEN, JG
[J]. APPLIED PHYSICS LETTERS, 1984, 45 (10) : 1146 - 1148
[8] LASER CHEMICAL VAPOR-DEPOSITION OF COPPER
HOULE, FA
JONES, CR
BAUM, T
PICO, C
KOVAC, CA
[J]. APPLIED PHYSICS LETTERS, 1985, 46 (02) : 204 - 206
[9] PHOTODEPOSITION OF ALUMINUM-OXIDE AND ALUMINUM THIN-FILMS
SOLANKI, R
RITCHIE, WH
COLLINS, GJ
[J]. APPLIED PHYSICS LETTERS, 1983, 43 (05) : 454 - 456
[10] PATTERNED PHOTONUCLEATION OF CHEMICAL VAPOR-DEPOSITION OF AL BY UV-LASER PHOTODEPOSITION
TSAO, JY
EHRLICH, DJ
[J]. APPLIED PHYSICS LETTERS, 1984, 45 (06) : 617 - 619