Plasma Jet Machining A novel technology for precision machining of optical elements

被引：37

作者：

Arnold, Thomas ^{[1
]}

Boehm, Georg ^{[1
]}

Eichentopf, Inga-Maria ^{[2
]}

Janietz, Manuela ^{[2
]}

Meister, Johannes ^{[2
]}

Schindler, Axel ^{[3
]}

机构：

[1] Leibniz Inst Oberflachenmodifizierung, Leibniz Gebiet Plasmajettechnol, Nachwuchsforsch Grp Ultraprazis Bearbeitung Atome, Leipzig, Germany

[2] Nachwuchsforsch Grp Ultraprazis Bearbeitung Atome, Leipzig, Germany

[3] Uni Leipzig, Grundung Leibniz Inst Oberflachenmodifizierung, Leipzig, Germany

来源：

VAKUUM IN FORSCHUNG UND PRAXIS | 2010年 / 22卷 / 04期

关键词：

D O I：

10.1002/vipr.201000423

中图分类号：

TH [机械、仪表工业];

学科分类号：

0802 ;

摘要：

Plasma Jet Machining (PJM) is a surface figuring technology based on atmospheric plasma assisted chemical etching or deposition, respectively. In both cases a sub-aperture plasma jet source is used combined with a CNC multi-axes system for the processing of curved surfaces. It is under development for the surface figuring of a variety of optical materials by IOM for about 15 years. PJM is capable to figure deep aspheric or free-form substrates with high material removal rate and high spatial resolution. Based on chemical reactions between plasma generated radicals and the surface PJM does not introduce any damage to the processed surface and sub-surface region in contrast to abrasive techniques. Deterministic deposition of SiO x layers and subsequent proportional transfer using ion beams or polishing is another plasma jet based technique for surface figuring that extends the range of machinable materials. The article gives an overview on the current state of PJM development in IOM and shows examples of its application.

引用

页码：10 / 16

页数：7

共 12 条

[1] Ultrahigh-rate plasma jet chemical etching of silicon [J].

Arnold, T ;

Boehm, G ;

Schindler, A .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 2001, 19 (05) :2586-2589

[2]

BOEHM G, 1999, P 9 INT C PROD ENG, P231

[3]

Boehm G., 2000, OPTICAL FABRICATION, P23

[4] A new reactive atom plasma technology (RAPT) for precision machining:: the etching of ULE® optical surfaces [J].

Fanara, Carlo ;

Shore, Paul ;

Nicholls, John R. ;

Lyford, Nicholas ;

Sommer, Phil ;

Fiske, Peter .

OPTOMECHANICAL TECHNOLOGIES FOR ASTRONOMY, PTS 1 AND 2, 2006, 6273

[5] Ultra-precision Surface Finishing by Ion Beam Techniques [J].

Haensel, T. ;

Frost, F. ;

Nickel, A. ;

Schindler, A. .

VAKUUM IN FORSCHUNG UND PRAXIS, 2007, 19 (05) :24-30

[6] Simulation of the Substrate Temperature Field for Plasma Assisted Chemical Etching [J].

Meister, Johannes ;

Boehm, Georg ;

Eichentopf, Inga-Maria ;

Arnold, Thomas .

PLASMA PROCESSES AND POLYMERS, 2009, 6 :S209-S213

[7]

Messelink Wilhelmus A. C. M., 2005, P SOC PHOTO-OPT INS, V5869, P38

[8]

Schindler A., 2004, P SOC PHOTO-OPT INS, V5180, P64

[9]

Siewert F., 2008, MODERN DEV XRAY NETU

[10] Fabrication of lightweight SiC aspheres using reactive atom plasma (RAP™)processing [J].

Subrahmanyan, Pradeep ;

Gardopee, George ;

Verma, Yogesh ;

Li, Ning ;

Yu, Tom ;

Kyler, Thomas ;

Fiske, Peter ;

Sommer, Philip .

OPTICAL MATERIALS AND STRUCTURES TECHNOLOGIES III, 2007, 6666 :A6660-A6660

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