LOW-ENERGY (LESS-THAN-OR-EQUAL-TO-100 EV) SPUTTERING OF THIN MOLYBDENUM NITRIDE FILMS

被引:10
作者
BALDWIN, DA
SHAMIR, N
HOCHMANN, P
RABALAIS, JW
机构
关键词
D O I
10.1016/0039-6028(83)90367-9
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
引用
收藏
页码:361 / 372
页数:12
相关论文
共 39 条
[1]   DESIGN-FEATURES AND FOCAL PROPERTIES OF SIMPLE 3 ELEMENT 2-DIMENSIONAL OR 3-DIMENSIONAL LENS SYSTEMS FOR DECELERATING INTENSE ION-BEAMS TO VERY LOW ENERGIES [J].
ALTON, GD ;
ROBERTO, JB ;
WHITE, CW ;
ZUHR, RA .
NUCLEAR INSTRUMENTS & METHODS, 1980, 177 (2-3) :273-280
[2]   DEPTH RESOLUTION OF SPUTTER PROFILING [J].
ANDERSEN, HH .
APPLIED PHYSICS, 1979, 18 (02) :131-140
[3]  
ANDERSEN HH, 1982, ADV ION IMPLANTATION
[4]  
ANDERSEN HH, 1980, PHYSICS IONIZED GASE, P431
[5]   MOLYBDENUM NITRIDE FILM GROWTH BY REACTION WITH N-2+ AND N+ BEAMS - ENERGY AND DOSE DEPENDENCE [J].
BALDWIN, DA ;
SHAMIR, N ;
RABALAIS, JW .
APPLICATIONS OF SURFACE SCIENCE, 1982, 11-2 (JUL) :229-234
[6]   KINETIC-ENERGY DEPENDENCE OF THE REACTIONS OF N+ AND N2(+) WITH MOLYBDENUM [J].
BALDWIN, DA ;
MURRAY, PT ;
RABALAIS, JW .
CHEMICAL PHYSICS LETTERS, 1981, 77 (02) :403-404
[7]  
BALDWIN DA, UNPUB REV SCI INSTR
[8]   SPUTTERING MECHANISM FOR LOW-ENERGY LIGHT-IONS [J].
BEHRISCH, R ;
MADERLECHNER, G ;
SCHERZER, BMU ;
ROBINSON, MT .
APPLIED PHYSICS, 1979, 18 (04) :391-398
[9]   AN ANALYTICAL FORMULA AND IMPORTANT PARAMETERS FOR LOW-ENERGY ION SPUTTERING [J].
BOHDANSKY, J ;
ROTH, J ;
BAY, HL .
JOURNAL OF APPLIED PHYSICS, 1980, 51 (05) :2861-2865