MEASUREMENT OF MAGNETOSTRICTION IN FERROMAGNETIC THIN-FILMS

被引:186
作者
KLOKHOLM, E [1 ]
机构
[1] IBM CORP,THOMAS J WATSON RES CTR,DIV SYST PROD,MFG RES LAB,YORKTOWN HTS,NY 10598
关键词
D O I
10.1109/TMAG.1976.1059251
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:819 / 821
页数:3
相关论文
共 2 条
[1]   MAGNETOSTRICTION OF THIN NI-FILMS [J].
GONTARZ, R ;
RATAJCZAK, H ;
SUDA, P .
PHYSICA STATUS SOLIDI, 1964, 6 (03) :909-912
[2]   MAGNETOSTRESS EFFECTS IN EVAPORATED NI FILMS [J].
KLOKHOLM, E ;
FREEDMAN, JF .
JOURNAL OF APPLIED PHYSICS, 1967, 38 (03) :1354-&