ON-AXIS LINEAR FOCUSED SPOT SCANNING MICROSTEREOLITHOGRAPHY SYSTEM: OPTOMECHATRONIC DESIGN, ANALYSIS AND DEVELOPMENT

被引:32
作者
Gandhi, Prasanna [1 ]
Deshmukh, Suhas [1 ]
Ramtekkar, Rahul [1 ]
Bhole, Kiran [1 ]
Baraki, Alem [1 ]
机构
[1] Indian Inst Technol, Dept Mech Engn, Bombay 400076, Maharashtra, India
关键词
Microstereolithography; 3D microfabrication; large microstructures; scanning schemes;
D O I
10.1142/S0219686713500030
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Microstereolithography (MSL) is technology of fabrication of three-dimensional (3D) components by using layer-by-layer photopolymerization. Typical design goals of MSL system are: small features, high resolution, high speed of fabrication, and large overall size of component. This paper focuses on design and development of such a system to meet these optomechatronic requirements. We first analyze various optical scanning schemes used for MSL systems along with the proposed scheme via optical simulations and experiments. Next, selection criteria for various subsystems are laid down and appropriate design decisions for the proposed system are made. Further, mechanical design of the scanning mechanism is carried out to meet requirements of high speed and resolution. Finally, system integration and investigation in process parameters is carried out and fabrication of large microcomponent with high resolution is demonstrated. The proposed system would be useful for fabrication of multiple/large microcomponents with high production rate in various applications.
引用
收藏
页码:43 / 68
页数:26
相关论文
共 28 条
[1]  
Aldrich S., HDDA MONOMER BEE PHO
[2]  
Bertsch A, 2003, MATER RES SOC SYMP P, V758, P3
[3]   3D micromixers - Downscaling large scale industrial static mixers [J].
Bertsch, A ;
Heimgartner, S ;
Cousseau, P ;
Renaud, P .
14TH IEEE INTERNATIONAL CONFERENCE ON MICRO ELECTRO MECHANICAL SYSTEMS, TECHNICAL DIGEST, 2001, :507-510
[4]   Microstereophotolithography using a liquid crystal display as dynamic mask-generator [J].
Bertsch, A ;
Zissi, S ;
Jezequel, JY ;
Corbel, S ;
Andre, JC .
MICROSYSTEM TECHNOLOGIES, 1997, 3 (02) :42-47
[5]  
Cho H.S., 2005, OPTOMECHATRONICS FUS
[6]  
Deshmukh S. P., 2006, P SOC PHOTO-OPT INS
[7]   Optomechanical scanning systems for microstereolithography (MSL): Analysis and experimental verification [J].
Deshmukh, Suhas ;
Gandhi, P. S. .
JOURNAL OF MATERIALS PROCESSING TECHNOLOGY, 2009, 209 (03) :1275-1285
[8]  
Farsari M., 1998, J MAT PROCESSTECHNOL, V107, P167
[9]  
Farsari M., 1998, LASERS ELECTRO OPTIC, P310
[10]  
Gandhi P., 2003, P 3 NAT C PREC ENG C