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- [1] NBN FILMS PREPARED BY MAGNETRON SPUTTERING JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1982, 21 (05): : 772 - 775
- [3] Properties of ITO films prepared by reactive magnetron sputtering Microchimica Acta, 2006, 156 : 61 - 67
- [5] Properties of Aluminum Oxynitride Films Prepared by Reactive Magnetron Sputtering 2014 IEEE 34TH INTERNATIONAL CONFERENCE ON ELECTRONICS AND NANOTECHNOLOGY (ELNANO), 2014, : 188 - 190
- [7] TiN/NbN multilayers prepared by asymmetrical bipolarpulsed reactive magnetron sputtering Cailiao Gongcheng/Journal of Materials Engineering, 2012, (07): : 92 - 96
- [9] Morphological, structural and mechanical properties of NbN thin films deposited by reactive magnetron sputtering SURFACE & COATINGS TECHNOLOGY, 2006, 200 (22-23): : 6544 - 6548
- [10] An investigation of structure and wear properties of TiN/NbN films deposited by reactive magnetron sputtering HIGH-PERFORMANCE CERAMICS V, PTS 1 AND 2, 2008, 368-372 : 1310 - +