PHOTON-INDUCED DISSOCIATION OF PHYSISORBED SF6 ON NI(111)

被引：17

作者：

KLEKAMP, A

UMBACH, E

机构：

[1] Physikalisches Institut, Universität Stuttgart

来源：

CHEMICAL PHYSICS LETTERS | 1990年 / 171卷 / 03期

关键词：

D O I：

10.1016/0009-2614(90)85232-2

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The physisorbed molecule SF6 on Ni(111) quickly dissociates under X-ray irradiation in mono- and multi-layers. For UPS no decomposition is observed for the SF6 monolayer, but rapid stimulated dissociation occurs in multilayers. This process is seven times more effective for HeI compared to HeII due to a resonant bonding-antibonding transition. The different dissociation behaviour in the monolayer regime is explained by a different transfer probability of single-particle excitations from molecule to substrates as compared to multiple excitations following the Auger decay of a core hole. © 1990.

引用

页码：233 / 238

页数：6

共 29 条

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