LOW-ENERGY ELECTRON-BEAM LITHOGRAPHY

被引：5

作者：

POLASKO, KJ

YAU, YW

PEASE, RFW

机构：

来源：

OPTICAL ENGINEERING | 1983年 / 22卷 / 02期

关键词：

D O I：

10.1117/12.7973081

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

页码：195 / 198

页数：4

共 13 条

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[9] FUNDAMENTAL ASPECTS OF ELECTRON-BEAM LITHOGRAPHY .2. LOW-VOLTAGE EXPOSURE OF NEGATIVE RESISTS [J].

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[10] GENERATION AND APPLICATIONS OF FINELY FOCUSED BEAMS OF LOW-ENERGY ELECTRONS [J].

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