A PLASMA X-RAY SOURCE FOR X-RAY-LITHOGRAPHY

被引：42

作者：

OKADA, I

SAITOH, Y

ITABASHI, S

YOSHIHARA, H

机构：

[1] NTT, Atsugi, Jpn, NTT, Atsugi, Jpn

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1986年 / 4卷 / 01期

关键词：

D O I：

10.1116/1.583449

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

X-RAY AND GAMMA RAY PRODUCTION

引用

页码：243 / 247

页数：5

共 12 条

[1]

Asakawa H., 1982, 1982 Symposium on VLSI Technology. Digest of Papers, P88

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[3] PROSPECTS FOR HIGH-BRIGHTNESS X-RAY SOURCES FOR LITHOGRAPHY [J].

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[5]

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[7]

MATTHEWS SM, 1982, P SOC PHOTO-OPT INST, V333, P136, DOI 10.1117/12.933425

[8]

NAGEL DJ, 1984, VLSI ELECTRON, V8, P132

[9] X-RAY-LITHOGRAPHY USING A PULSED PLASMA SOURCE [J].

PEARLMAN, JS ;

RIORDAN, JC .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04) :1190-1193

[10] SUB-MICRON PATTERN REPLICATION USING A HIGH CONTRAST MASK AND 2-LAYER RESIST IN X-RAY-LITHOGRAPHY [J].

SAITOH, Y ;

YOSHIHARA, H ;

WATANABE, I ;

NAKAYAMA, S .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1984, 2 (01) :63-67

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