ANALYSIS OF STRESS-DISTRIBUTION IN SEMICONDUCTOR SUBSTRATES WITH FILM EDGES

被引：9
作者：
FISCHER, A
机构：
来源：
CRYSTAL RESEARCH AND TECHNOLOGY | 1983年 / 18卷 / 11期
关键词：
D O I：
10.1002/crat.2170181121
中图分类号：
O7 [晶体学];
学科分类号：
0702 ; 070205 ; 0703 ; 080501 ;
摘要：
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页码：1415 / 1422
页数：8
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[4]   STRESS DISTRIBUTIONS IN SILICON CRYSTAL SUBSTRATES WITH THIN-FILMS [J].
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