EFFECT OF BACKGROUND-GAS IMPURITIES ON FORMATION OF SPUTTERED BETA-TANTALUM FILMS

被引：26
作者：
SOSNIAK, J
POLITO, WJ
ROZGONYI, GA
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1967年 / 38卷 / 08期
关键词：
D O I：
10.1063/1.1710059
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：3041 / &
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