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- [5] Chemical vapor deposition of tantalum nitride films using pentakis(diethylamido)tantalum and ammoniaADVANCED INTERCONNECTS AND CONTACT MATERIALS AND PROCESSES FOR FUTURE INTEGRATED CIRCUITS, 1998, 514 : 531 - 536Cho, SLKim, KBMin, SHShin, HK
- [6] REACTION PROCESS OF VANADIUM TETRACHLORIDE WITH AMMONIA IN THE VAPOR-PHASE AND PROPERTIES OF THE VANADIUM NITRIDE FORMEDBULLETIN OF THE CHEMICAL SOCIETY OF JAPAN, 1982, 55 (11) : 3446 - 3449SAEKI, YSHIMIZU, TYAJIMA, AMATSUZAKI, R
- [7] REACTION PROCESS OF TITANIUM TETRACHLORIDE WITH AMMONIA IN THE VAPOR-PHASE AND PROPERTIES OF THE TITANIUM NITRIDE FORMEDBULLETIN OF THE CHEMICAL SOCIETY OF JAPAN, 1982, 55 (10) : 3193 - 3196SAEKI, YMATSUZAKI, RYAJIMA, AAKIYAMA, M
- [9] REACTION PROCESS OF ZIRCONIUM TETRACHLORIDE WITH AMMONIA IN THE VAPOR-PHASE AND PROPERTIES OF THE ZIRCONIUM NITRIDE FORMEDBULLETIN OF THE CHEMICAL SOCIETY OF JAPAN, 1983, 56 (09) : 2638 - 2642YAJIMA, ASEGAWA, YMATSUZAKI, RSAEKI, Y
- [10] The Photoelectrochemical and Photocatalytic Properties of Tantalum Oxide and Tantalum NitrideJOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2019, 166 (05) : H3294 - H3299Khanal, VijayIrani, RowshanakFiechter, SebastianAbdi, Fatwa F.Subramanian, Vaidyanathan