OPEN-BASE BREAKDOWN IN DIFFUSED N-P-N JUNCTION TRANSISTORS

被引:6
作者
KENNEDY, DP
OBRIEN, RR
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D O I
10.1080/00207216508937754
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TM [电工技术]; TN [电子技术、通信技术];
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0808 ; 0809 ;
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页码:133 / +
页数:1
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共 10 条
[1]   IONIZATION RATES FOR ELECTRONS AND HOLES IN SILICON [J].
CHYNOWETH, AG .
PHYSICAL REVIEW, 1958, 109 (05) :1537-1540
[2]  
Jost W., 1952, DIFFUSION SOLIDS LIQ
[3]   BASE REGION TRANSPORT CHARACTERISTICS OF A DIFFUSED TRANSISTOR [J].
KENNEDY, DP ;
MURLEY, PC .
JOURNAL OF APPLIED PHYSICS, 1962, 33 (01) :120-&
[4]  
KENNEDY DP, 1961, J ELECTRON CONTR, V11, P303
[5]  
KENNEDY DP, 1962, IRE T ELECTRON DEV, VED9, P136
[6]  
KENNEDY DP, 1962, IRE T ELECTRON DEV, VED9, P478
[7]   DETERMINATION OF AVALANCHE BREAKDOWN IN PN JUNCTIONS [J].
MASERJIAN, J .
JOURNAL OF APPLIED PHYSICS, 1959, 30 (10) :1613-1614
[8]   ALLOYED JUNCTION AVALANCHE TRANSISTORS [J].
MILLER, SL ;
EBERS, JJ .
BELL SYSTEM TECHNICAL JOURNAL, 1955, 34 (05) :883-902
[9]  
SHANKEL H, 1955, P NAT ELECT C, V10, P614
[10]  
SHANKEL H, 1956, P IRE, V44, P360