BLOCK COPOLYMERS AS BILEVEL RESISTS

被引：24

作者：

HARTNEY, MA ^{[1
]}

NOVEMBRE, AE ^{[1
]}

BATES, FS ^{[1
]}

机构：

[1] AT&T BELL LABS,MURRAY HILL,NJ 07974

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1985年 / 3卷 / 05期

关键词：

D O I：

10.1116/1.582991

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1346 / 1351

页数：6

共 14 条

[1]

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[2]

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[3]

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[4] LITHOGRAPHIC EVALUATION AND PROCESSING OF CHLORINATED POLYMETHYLSTYRENE [J].

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NOVEMBRE, AE .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (01) :360-366

[5]

HATZAKIS M, 1981, SEP P MICR ENG

[6]

KRAUSE S, 1978, POLYM BLENDS, V1

[7]

LIN BJ, 1983, ACS S SER, V219

[8]

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[9] HIGH-RESOLUTION DOUBLE-LAYER RESIST SYSTEM USING NEW SILICONE BASED NEGATIVE RESIST (SNR) [J].

MORITA, M ;

TANAKA, A ;

IMAMURA, S ;

TAMAMURA, T ;

KOGURE, O .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1983, 22 (10) :L659-L660

[10] BLOCK COPOLYMERS OF POLYDIMETHYLSILOXANE AND POLYSTYRENE [J].

SAAM, JC ;

GORDON, DJ ;

LINDSEY, S .

MACROMOLECULES, 1970, 3 (01) :1-&

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