Photoconductivity and surface chemical analysis of ZnO thin films deposited by solution-processing techniques for nano and microstructure fabrication

被引:12
|
作者
Dwivedi, V. K. [1 ,2 ]
Srivastava, P. [2 ]
Prakash, G. Vijaya [1 ]
机构
[1] Indian Inst Technol Delhi, Dept Phys, Nanophoton Lab, New Delhi 110016, India
[2] Indian Inst Technol Delhi, Dept Phys, Nanostech Lab, New Delhi 110016, India
关键词
zinc oxide; electrochemical deposition; surface analysis; X-ray photoelectron spectroscopy; photocurrent response; optoelectronic applications;
D O I
10.1088/1674-4926/34/3/033001
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
The fabrication of zinc oxide (ZnO) from inexpensive solution-processing techniques, namely, electrochemical deposition and electrospinning were explored on various conducting and mesoporous semiconducting surfaces. Optimised conditions were derived for template- and self-assisted nano/micro structures and composites. ZnO thin films were annealed at a fixed temperature under ambient conditions and characterised using physical and optical techniques. The photocurrent response in the UV region shows a fast rise and double decay behaviour with a fast component followed by a slow oscillatory decay. Photocurrent results were correlated with surface chemical analysis from X-ray photoelectron spectroscopy. Various characterisation details reveal the importance of fabrication parameter optimisation for useful low-cost optoelectronic applications.
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页数:5
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