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- [3] Crystallization behaviour of amorphous Si0.5Ge0.5 films observed by positron annihilation NANOPHASE AND NANOCOMPOSITE MATERIALS III, 2000, 581 : 187 - 192
- [5] SELECTIVE ETCHING OF SILICON IN PREFERENCE TO GERMANIUM AND SI0.5GE0.5 2017 INTERNATIONAL SYMPOSIUM ON VLSI TECHNOLOGY, SYSTEMS AND APPLICATION (VLSI-TSA), 2017,
- [10] Relaxation of strained silicon on Si0.5Ge0.5 virtual substrates ULIS 2008: PROCEEDINGS OF THE 9TH INTERNATIONAL CONFERENCE ON ULTIMATE INTEGRATION ON SILICON, 2008, : 211 - 214