CHEMICAL VAPOR-DEPOSITION OF HYDROGENATED AMORPHOUS-SILICON

被引：11

作者：

KURTZ, SR

PROSCIA, J

GORDON, RG

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1986年 / 59卷 / 01期

关键词：

D O I：

10.1063/1.336872

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：249 / 256

页数：8

共 21 条

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