SECONDARY ION MASS-SPECTROMETRIC IMAGE DEPTH PROFILE ANALYSIS OF THIN-LAYERS

被引：7

作者：

CHU, PK ^{[1
]}

HARRIS, WC ^{[1
]}

MORRISON, GH ^{[1
]}

机构：

[1] CORNELL UNIV,BAKER LAB,DEPT CHEM,ITHACA,NY 14853

来源：

ANALYTICAL CHEMISTRY | 1982年 / 54卷 / 13期

关键词：

D O I：

10.1021/ac00250a017

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

引用

页码：2208 / 2210

页数：3

共 13 条

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[5]

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[6] ION-IMPLANTED STANDARDS FOR SECONDARY ION MASS-SPECTROMETRIC DETERMINATION OF THE 1A-7A GROUP ELEMENTS IN SEMICONDUCTING MATRICES [J].

LETA, DP ;

MORRISON, GH .

ANALYTICAL CHEMISTRY, 1980, 52 (03) :514-519

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[9]

PANISH MB, 1980, SCIENCE, V20, P916

[10] SECONDARY ION MASS-SPECTROMETRIC IMAGE DEPTH PROFILING FOR 3-DIMENSIONAL ELEMENTAL ANALYSIS [J].

PATKIN, AJ ;

MORRISON, GH .

ANALYTICAL CHEMISTRY, 1982, 54 (01) :2-5

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