PHOTOEMISSION-STUDIES OF THE INITIAL ADSORPTION AND GROWTH OF AG ANDAU ON GE AND SI

被引：43

作者：

WACHS, AL ^{[1
]}

MILLER, T ^{[1
]}

SHAPIRO, AP ^{[1
]}

CHIANG, TC ^{[1
]}

机构：

[1] UNIV ILLINOIS,PHYS RES LAB,URBANA,IL 61801

来源：

PHYSICAL REVIEW B | 1987年 / 35卷 / 11期

关键词：

D O I：

10.1103/PhysRevB.35.5514

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：5514 / 5523

页数：10

共 39 条

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