GROWTH OF GAAS BY METALORGANIC CHEMICAL VAPOR-DEPOSITION USING THERMALLY DECOMPOSED TRIMETHYLARSENIC

被引：41
作者：
VOOK, DW
REYNOLDS, S
GIBBONS, JF
机构：
来源：
APPLIED PHYSICS LETTERS | 1987年 / 50卷 / 19期
关键词：
D O I：
10.1063/1.97865
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：1386 / 1387
页数：2
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