DEPTH PROFILE OF SILVER IN A MATRIX OF SILICON DIOXIDE BY RUTHERFORD BACKSCATTERING SPECTROMETRY

被引：1

作者：

LEAVITT, JA

ROLLINS, DK

FERNANDO, Q

机构：

[1] UNIV ARIZONA,DEPT CHEM,TUCSON,AZ 85721

[2] UNIV ARIZONA,DEPT PHYS,TUCSON,AZ 85721

来源：

ANALYTICAL CHEMISTRY | 1986年 / 58卷 / 01期

关键词：

D O I：

10.1021/ac00292a022

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

引用

页码：90 / 93

页数：4

共 12 条

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ESHBACK HL, CENTRAL BUREAU NUCLE

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