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CHARACTERIZATION OF COATINGS
被引:22
作者
:
BENNINGHOVEN, A
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MUNSTER,INST PHYS,D-4400 MUNSTER,FED REP GER
UNIV MUNSTER,INST PHYS,D-4400 MUNSTER,FED REP GER
BENNINGHOVEN, A
[
1
]
机构
:
[1]
UNIV MUNSTER,INST PHYS,D-4400 MUNSTER,FED REP GER
来源
:
THIN SOLID FILMS
|
1976年
/ 39卷
/ DEC期
关键词
:
D O I
:
10.1016/0040-6090(76)90620-9
中图分类号
:
T [工业技术];
学科分类号
:
08 ;
摘要
:
引用
收藏
页码:3 / 23
页数:21
相关论文
共 45 条
[41]
ALLOY SPUTTERING STUDIES WITH IN-SITU AUGER ELECTRON SPECTROSCOPY
[J].
TARNG, ML
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TARNG, ML
;
WEHNER, GK
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0
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WEHNER, GK
.
JOURNAL OF APPLIED PHYSICS,
1971,
42
(06)
:2449
-&
[42]
DETERMINATION OF SURFACE CONTAMINATION ON SILICON BY LARGE ANGLE ION SCATTERING
[J].
THOMPSON, DA
论文数:
0
引用数:
0
h-index:
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机构:
Solid State Devices Department, Canadian Westinghouse Company Limited, Hamilton, Ont.
THOMPSON, DA
;
BARBER, HD
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BARBER, HD
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机构:
Solid State Devices Department, Canadian Westinghouse Company Limited, Hamilton, Ont.
MACKINTOSH, WD
.
APPLIED PHYSICS LETTERS,
1969,
14
(03)
:102
-+
[43]
Werner H. W., 1973, Radiation Effects, V18, P269, DOI 10.1080/00337577308232134
[44]
THEORETICAL AND EXPERIMENTAL ASPECTS OF SECONDARY ION MASS-SPECTROMETRY
[J].
WERNER, HW
论文数:
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机构:
PHILIPS RES LABS,EINDHOVEN,NETHERLANDS
PHILIPS RES LABS,EINDHOVEN,NETHERLANDS
WERNER, HW
.
VACUUM,
1974,
24
(10)
:493
-504
[45]
USE OF SECONDARY ION MASS-SPECTROMETRY IN SURFACE ANALYSIS
[J].
WERNER, HW
论文数:
0
引用数:
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h-index:
0
机构:
PHILIPS RES LABS,EINDHOVEN,NETHERLANDS
PHILIPS RES LABS,EINDHOVEN,NETHERLANDS
WERNER, HW
.
SURFACE SCIENCE,
1975,
47
(01)
:301
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←
1
2
3
4
5
→
共 45 条
[41]
ALLOY SPUTTERING STUDIES WITH IN-SITU AUGER ELECTRON SPECTROSCOPY
[J].
TARNG, ML
论文数:
0
引用数:
0
h-index:
0
TARNG, ML
;
WEHNER, GK
论文数:
0
引用数:
0
h-index:
0
WEHNER, GK
.
JOURNAL OF APPLIED PHYSICS,
1971,
42
(06)
:2449
-&
[42]
DETERMINATION OF SURFACE CONTAMINATION ON SILICON BY LARGE ANGLE ION SCATTERING
[J].
THOMPSON, DA
论文数:
0
引用数:
0
h-index:
0
机构:
Solid State Devices Department, Canadian Westinghouse Company Limited, Hamilton, Ont.
THOMPSON, DA
;
BARBER, HD
论文数:
0
引用数:
0
h-index:
0
机构:
Solid State Devices Department, Canadian Westinghouse Company Limited, Hamilton, Ont.
BARBER, HD
;
MACKINTOSH, WD
论文数:
0
引用数:
0
h-index:
0
机构:
Solid State Devices Department, Canadian Westinghouse Company Limited, Hamilton, Ont.
MACKINTOSH, WD
.
APPLIED PHYSICS LETTERS,
1969,
14
(03)
:102
-+
[43]
Werner H. W., 1973, Radiation Effects, V18, P269, DOI 10.1080/00337577308232134
[44]
THEORETICAL AND EXPERIMENTAL ASPECTS OF SECONDARY ION MASS-SPECTROMETRY
[J].
WERNER, HW
论文数:
0
引用数:
0
h-index:
0
机构:
PHILIPS RES LABS,EINDHOVEN,NETHERLANDS
PHILIPS RES LABS,EINDHOVEN,NETHERLANDS
WERNER, HW
.
VACUUM,
1974,
24
(10)
:493
-504
[45]
USE OF SECONDARY ION MASS-SPECTROMETRY IN SURFACE ANALYSIS
[J].
WERNER, HW
论文数:
0
引用数:
0
h-index:
0
机构:
PHILIPS RES LABS,EINDHOVEN,NETHERLANDS
PHILIPS RES LABS,EINDHOVEN,NETHERLANDS
WERNER, HW
.
SURFACE SCIENCE,
1975,
47
(01)
:301
-323
←
1
2
3
4
5
→