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LOW-TEMPERATURE EPITAXIAL-GROWTH OF (100) SILICON
被引:3
|
作者
:
论文数:
引用数:
h-index:
机构:
MILOSAVLJEVIC, M
[
1
]
JEYENS, C
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV SURREY,GUILDFORD GU2 5XH,SURREY,ENGLAND
UNIV SURREY,GUILDFORD GU2 5XH,SURREY,ENGLAND
JEYENS, C
[
1
]
WILSON, IH
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV SURREY,GUILDFORD GU2 5XH,SURREY,ENGLAND
UNIV SURREY,GUILDFORD GU2 5XH,SURREY,ENGLAND
WILSON, IH
[
1
]
机构
:
[1]
UNIV SURREY,GUILDFORD GU2 5XH,SURREY,ENGLAND
来源
:
ELECTRONICS LETTERS
|
1983年
/ 19卷
/ 17期
关键词
:
D O I
:
10.1049/el:19830456
中图分类号
:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号
:
0808 ;
0809 ;
摘要
:
引用
收藏
页码:669 / 671
页数:3
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