THE NATURE OF THE CHARGED SELF-INTERSTITIAL IN SILICON

被引:16
作者
KHOO, GS
ONG, CK
机构
来源
JOURNAL OF PHYSICS C-SOLID STATE PHYSICS | 1987年 / 20卷 / 31期
关键词
D O I
10.1088/0022-3719/20/31/008
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
引用
收藏
页码:5037 / 5043
页数:7
相关论文
共 15 条
[11]   RELAXATION ABOUT VACANCY IN DIAMOND [J].
MAINWOOD, A .
JOURNAL OF PHYSICS C-SOLID STATE PHYSICS, 1978, 11 (13) :2703-2710
[12]   INTERSTITIAL MUONS AND HYDROGEN IN DIAMOND AND SILICON [J].
MAINWOOD, A ;
STONEHAM, AM .
JOURNAL OF PHYSICS C-SOLID STATE PHYSICS, 1984, 17 (14) :2513-2524
[13]   STRUCTURE AND MOTION OF THE SELF-INTERSTITIAL IN DIAMOND [J].
MAINWOOD, A ;
LARKINS, FP ;
STONEHAM, AM .
SOLID-STATE ELECTRONICS, 1978, 21 (11-1) :1431-1433
[14]   NATURE AND DIFFUSION OF THE SELF-INTERSTITIAL IN SILICON [J].
MASRI, P ;
HARKER, AH ;
STONEHAM, AM .
JOURNAL OF PHYSICS C-SOLID STATE PHYSICS, 1983, 16 (18) :L613-L616
[15]   MODELS FOR 2 INTENSE SI-H INFRARED STRETCHING BANDS IN FZ-SI GROWN IN HYDROGEN [J].
ONG, CK ;
KHOO, GS .
JOURNAL OF PHYSICS C-SOLID STATE PHYSICS, 1987, 20 (03) :419-423