RESISTS FOR MICROLITHOGRAPHY - PRESENT STATUS AND RECENT RESEARCH TRENDS

被引：15
作者：
SUGITA, K
UENO, N
机构：
[1] Chiba University, Department of Speciality Materials, Inage-ku, Chiba, 263, Yayoi-cho
来源：
PROGRESS IN POLYMER SCIENCE | 1992年 / 17卷 / 03期
关键词：
D O I：
10.1016/0079-6700(92)90019-U
中图分类号：
O63 [高分子化学（高聚物）];
学科分类号：
070305 ; 080501 ; 081704 ;
摘要：
[No abstract available]
引用
收藏
页码：319 / 360
页数：42
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