LOW-ABERRATION EINZEL LENS FOR A FOCUSED-ION-BEAM SYSTEM

被引：9

作者：

KURIHARA, K

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 1985年 / 24卷 / 02期

关键词：

D O I：

10.1143/JJAP.24.225

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：225 / 230

页数：6

共 13 条

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[9] ELECTROSTATIC EINZEL LENSES WITH REDUCED SPHERICAL-ABERRATION FOR USE IN FIELD-EMISSION GUNS [J].

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