INFLUENCE OF THE CONTINUOUS MECHANICAL RENEWAL OF THE ELECTRODE SURFACE ON THE EFFECTIVE ACTIVATION-ENERGY OF COPPER DEPOSITION ON A COPPER CATHODE IN THE TAFEL POTENTIAL REGION

被引：2
作者：
NONINSKI, CI
VELEVA, LP
NONINSKI, VC
机构：
来源：
SURFACE TECHNOLOGY | 1985年 / 25卷 / 02期
关键词：
D O I：
10.1016/0376-4583(85)90026-3
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：135 / 139
页数：5
相关论文
共 22 条
[1]  
AFFANASIEV G, 1966, KHIM TEKHN RESP MEZH, P3
[2]  
BOCKRIS J, 1959, 4TH P C EL MOSC, P380
[3]   MECHANISM OF ELECTRODEPOSITION AND DISSOLUTION PROCESSES OF COPPER IN AQUEOUS SOLUTIONS [J].
BOCKRIS, JO ;
ENYO, M .
TRANSACTIONS OF THE FARADAY SOCIETY, 1962, 58 (474) :1187-&
[4]  
BROWN OR, 1965, ELECTROCHIM ACTA, V10, P383
[5]  
EMELYANENKO GA, 1962, ZH FIZ KHIM+, V36, P1532
[6]  
Gorbachev S. V., 1959, 4 T SOV EL, P61
[7]  
GORBACHEV SV, 1951, ZH FIZ KHIM+, V25, P1384
[8]  
IVANOV I, 1976, THESIS HIGHER I CHEM
[9]  
IZMAILOV A, 1958, IZV VYSSH UCHEBN ZAV, V1, P118
[10]  
IZMAILOV A, 1957, T MOSK KHIM TEKHNOL, P348
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