KINETICS OF NITRIDE FORMATION ON TITANIUM TARGETS DURING REACTIVE SPUTTERING

被引:115
作者
SUNDGREN, JE
JOHANSSON, BO
KARLSSON, SE
机构
关键词
D O I
10.1016/S0039-6028(83)80031-4
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
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页码:265 / 280
页数:16
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共 39 条
[1]   DEPOSITION RATE OF METALLIC THIN-FILMS IN REACTIVE SPUTTERING PROCESS [J].
ABE, T ;
YAMASHINA, T .
THIN SOLID FILMS, 1975, 30 (01) :19-27
[2]   RADIATION EFFECTS ON SOLID-STATE DIFFUSION [J].
ADDA, Y ;
BEYELER, M ;
BREBEC, G .
THIN SOLID FILMS, 1975, 25 (01) :107-156
[3]   Adsorption of gases in multimolecular layers [J].
Brunauer, S ;
Emmett, PH ;
Teller, E .
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1938, 60 :309-319
[4]   REACTIVE ION-BEAM SPUTTERING OF THIN-FILMS OF LEAD, ZIRCONIUM AND TITANIUM [J].
CASTELLANO, RN .
THIN SOLID FILMS, 1977, 46 (02) :213-221
[5]  
CHAPMAN B, 1980, GLOW DISCHARGE PROCE, P182
[6]   EFFECT OF TARGET OXIDATION ON REACTIVE SPUTTERING RATES OF TITANIUM IN ARGON-OXYGEN PLASMAS [J].
DONAGHEY, LF ;
GERAGHTY, KG .
THIN SOLID FILMS, 1976, 38 (03) :271-280
[7]   DIFFUSION ENHANCEMENT DUE TO LOW-ENERGY ION-BOMBARDMENT DURING SPUTTER ETCHING AND DEPOSITION [J].
ELTOUKHY, AH ;
GREENE, JE .
JOURNAL OF APPLIED PHYSICS, 1980, 51 (08) :4444-4452
[8]   MECHANISMS OF REACTIVE SPUTTERING OF INDIUM .3. A GENERAL PHENOMENOLOGICAL MODEL FOR REACTIVE SPUTTERING [J].
ELTOUKHY, AH ;
NATARAJAN, BR ;
GREENE, JE ;
BARR, TL .
THIN SOLID FILMS, 1980, 69 (02) :229-235
[9]  
FRIED V, 1977, PHYSICAL CHEM
[10]   KINETICS OF REACTIVE SPUTTER DEPOSITION OF TITANIUM OXIDES [J].
GERAGHTY, KG ;
DONAGHEY, LF .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1976, 123 (08) :1201-1207