ELECTRICAL END-POINT DETECTION DURING ION-BEAM ETCHING OF THIN-FILMS AND MULTILAYERS

被引：5
|
作者：
MATTHES, A
SCHMIDL, F
BARHOLZ, KU
ELSCHNER, F
SCHNEIDEWIND, H
SEIDEL, P
机构：
[1] Inst. fur Festkorperphys., Friedrich-Schiller-Univ., Jena
来源：
SUPERCONDUCTOR SCIENCE & TECHNOLOGY | 1995年 / 8卷 / 08期
关键词：
D O I：
10.1088/0953-2048/8/8/013
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
We propose the in situ measurement of the sample resistance to control the end-point detection during ion beam etching (IBE). The technical requirements are presented. Models for the time dependence of the resistance during the IBE process are discussed and compared to the results of our measurements on samples with thin films and multilayers which are usual in high-T-c superconducting technology.
引用
收藏
页码：676 / 679
页数：4
相关论文
共 50 条
  • [31] EFFECTS OF AR ION-BEAM ETCHING ON GD-BA-CU-O SUPERCONDUCTING THIN-FILMS
    ENOKIHARA, A
    HIGASHINO, H
    KOHIKI, S
    SETSUNE, K
    WASA, K
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1989, 28 (03): : L452 - L455
  • [32] ROLE OF ION-BEAM ENERGY FOR CRYSTALLINE GROWTH OF THIN-FILMS
    OGATA, K
    ANDOH, Y
    FUJIMOTO, F
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1993, 80-1 : 1427 - 1430
  • [33] DEPOSITION AND EVALUATION OF THIN-FILMS BY DC ION-BEAM SPUTTERING
    SCHMIDT, PH
    SPENCER, EG
    CASTELLANO, RN
    SOLID STATE TECHNOLOGY, 1972, 15 (07) : 27 - +
  • [34] ARGON ION-BEAM EFFECTS UPON PHOTOEMISSIVE THIN-FILMS
    DOLIZY, P
    GROLIERE, F
    MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 1989, 116 : 161 - 166
  • [35] SYNTHESIS OF GRADIENT THIN-FILMS BY ION-BEAM ENHANCED DEPOSITION
    LIU, XH
    ZHOU, JK
    ZOU, SC
    TANIGUCHI, S
    SCHROER, A
    WOLF, GK
    MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 1991, 139 : 220 - 224
  • [36] REACTIVE ION-BEAM DEPOSITION OF ALUMINUM NITRIDE THIN-FILMS
    BHAT, S
    ASHOK, S
    FONASH, SJ
    TONGSON, L
    JOURNAL OF ELECTRONIC MATERIALS, 1985, 14 (04) : 405 - 418
  • [37] EARLY GROWTH OF THIN-FILMS DEPOSITED BY ION-BEAM SPUTTERING
    MAA, JS
    HUTCHINSON, TE
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (01): : 116 - 121
  • [38] DEPOSITION OF FERROMAGNETIC METAL THIN-FILMS BY ION-BEAM SPUTTERING
    ISHII, K
    NAOE, M
    YAMANAKA, S
    IEEE TRANSACTIONS ON MAGNETICS, 1979, 15 (06) : 1830 - 1832
  • [39] ION-BEAM SPUTTERING AND PROPERTIES OF YBACUO SUPERCONDUCTING THIN-FILMS
    PAVUNA, D
    BAER, W
    BERGER, H
    MATHIEU, HJ
    VOGEL, A
    SCHMIDT, M
    GASPAROV, V
    AFFRONTE, M
    VASEY, F
    REINHART, FK
    PHYSICA C, 1988, 153 (02): : 1449 - 1450
  • [40] ENERGY CONSIDERATIONS FOR PREPARING THIN-FILMS BY ION-BEAM DEPOSITION
    JAIN, A
    THIN SOLID FILMS, 1992, 219 (1-2) : 266 - 269
12345