MEASUREMENTS OF DIFFUSION-COEFFICIENT OF CF2 RADICAL IN DC PULSED CF4/O-2 DISCHARGE PLASMA

被引：4
|
作者：
ARAI, T
GOTO, M
TAKAYAMA, D
SHIMIZU, T
MURAKAMI, M
机构：
[1] Department of Electronic and Electrical Engineering, Kanagawa Institute of Technology
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1994年 / 33卷 / 7B期
关键词：
ETCHING PLASMA; CF2; RADICAL; DIFFUSION COEFFICIENT; CF4/O-2; PLASMA; LASER-INDUCED FLUORESCENCE;
D O I：
10.1143/JJAP.33.4170
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Laser-induced fluorescence has been used to measure the CF2 radical ground-state densities after extinction of DC pulsed CF4/O-2 discharge plasma. From the measurement, the CF2 radical was shown to be removed mainly by a diffusion process. Its diffusion coefficients are found to be D=150 cm(2.)Torr(.)s(-1) in O-2 and D=65 cm(2.)Torr(.)s(-1) in CF4 at room temperature.
引用
收藏
页码：4170 / 4172
页数：3
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