A HOLLOW-CATHODE FOR ION-BEAM PROCESSING PLASMA SOURCES

被引：1

|

作者：

ASTON, G

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1983年 / 1卷 / 02期

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D O I：

10.1116/1.572108

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

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页码：258 / 259

页数：2

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