MEASUREMENT OF DEEP LEVELS IN HYDROGENATED AMORPHOUS-SILICON BY TRANSIENT VOLTAGE SPECTROSCOPY

被引:41
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JOHNSON, NM
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10.1063/1.93822
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O59 [应用物理学];
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页码:981 / 983
页数:3
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[1]   DIRECT MEASUREMENT OF THE BULK-DENSITY OF GAP STATES IN N-TYPE HYDROGENATED AMORPHOUS-SILICON [J].
COHEN, JD ;
LANG, DV ;
HARBISON, JP .
PHYSICAL REVIEW LETTERS, 1980, 45 (03) :197-200
[2]   CALCULATION OF THE DYNAMIC-RESPONSE OF SCHOTTKY BARRIERS WITH A CONTINUOUS DISTRIBUTION OF GAP STATES [J].
COHEN, JD ;
LANG, DV .
PHYSICAL REVIEW B, 1982, 25 (08) :5321-5350
[3]   TRAP SPECTROSCOPY OF A-SI-H DIODES USING TRANSIENT CURRENT TECHNIQUES [J].
CRANDALL, RS .
JOURNAL OF ELECTRONIC MATERIALS, 1980, 9 (04) :713-726
[4]   MEASUREMENT OF SEMICONDUCTOR INSULATOR INTERFACE STATES BY CONSTANT-CAPACITANCE, DEEP-LEVEL TRANSIENT SPECTROSCOPY [J].
JOHNSON, NM .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 21 (02) :303-314
[5]   CONSTANT-CAPACITANCE DLTS MEASUREMENT OF DEFECT-DENSITY PROFILES IN SEMICONDUCTORS [J].
JOHNSON, NM ;
BARTELINK, DJ ;
GOLD, RB ;
GIBBONS, JF .
JOURNAL OF APPLIED PHYSICS, 1979, 50 (07) :4828-4833
[6]   MEASUREMENT OF THE DENSITY OF GAP STATES IN HYDROGENATED AMORPHOUS-SILICON BY SPACE-CHARGE SPECTROSCOPY [J].
LANG, DV ;
COHEN, JD ;
HARBISON, JP .
PHYSICAL REVIEW B, 1982, 25 (08) :5285-5320
[7]   ENERGY-DEPENDENCE OF ELECTRON-CAPTURE CROSS-SECTION OF GAP STATES IN N-TYPE ALPHA-SI-H [J].
OKUSHI, H ;
TOKUMARU, Y ;
YAMASAKI, S ;
OHEDA, H ;
TANAKA, K .
PHYSICAL REVIEW B, 1982, 25 (06) :4313-4316
[8]   DETERMINATION OF THE DENSITY OF STATE DISTRIBUTION OF A-SI-H BY ISOTHERMAL CAPACITANCE TRANSIENT SPECTROSCOPY [J].
OKUSHI, H ;
TOKUMARU, Y ;
YAMASAKI, S ;
OHEDA, H ;
TANAKA, K .
JAPANESE JOURNAL OF APPLIED PHYSICS, 1981, 20 (07) :L549-L552
[9]   LUMINESCENCE STUDIES OF PLASMA-DEPOSITED HYDROGENATED SILICON [J].
STREET, RA ;
KNIGHTS, JC ;
BIEGELSEN, DK .
PHYSICAL REVIEW B, 1978, 18 (04) :1880-1891