A 1-1 ELECTRON STEPPER

[1] EBES - PRACTICAL ELECTRON LITHOGRAPHIC SYSTEM [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1975, ED22 (07) : 385 - 392

[2] AN ELECTRON IMAGING SYSTEM FOR FABRICATION OF INTEGRATED CIRCUITS [J]. SOLID-STATE ELECTRONICS, 1969, 12 (11) : 841 - &

[3] ELECTRON IMAGE PROJECTOR WITH AUTOMATIC ALIGNMENT [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1975, ED22 (07) : 409 - 413

[4] WARD R, 1983, P SOC PHOTO-OPT INST, V393, P233, DOI 10.1117/12.935115

[5] WARD R, 1982, J VAC SCI TECHNOL, V19, P966

[6] WARD R, 1980, J VAC SCI TECHNOL, V16, P1830

[7] FLATNESS, CONTRAST, AND RESOLUTION CONSIDERATIONS OF CATHODE PROJECTION MICROFABRICATION SYSTEMS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06): : 1313 - 1316

[1] EBES - PRACTICAL ELECTRON LITHOGRAPHIC SYSTEM [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1975, ED22 (07) : 385 - 392

[2] AN ELECTRON IMAGING SYSTEM FOR FABRICATION OF INTEGRATED CIRCUITS [J]. SOLID-STATE ELECTRONICS, 1969, 12 (11) : 841 - &

[3] ELECTRON IMAGE PROJECTOR WITH AUTOMATIC ALIGNMENT [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1975, ED22 (07) : 409 - 413

[4] WARD R, 1983, P SOC PHOTO-OPT INST, V393, P233, DOI 10.1117/12.935115

[5] WARD R, 1982, J VAC SCI TECHNOL, V19, P966

[6] WARD R, 1980, J VAC SCI TECHNOL, V16, P1830

[7] FLATNESS, CONTRAST, AND RESOLUTION CONSIDERATIONS OF CATHODE PROJECTION MICROFABRICATION SYSTEMS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06): : 1313 - 1316