RECOMBINATION LIFETIME IN OXYGEN-PRECIPITATED SILICON

被引:19
作者
HWANG, JM
SCHRODER, DK
GOODMAN, AM
机构
[1] RCA LABS,PRINCETON,NJ 08540
[2] ARIZONA STATE UNIV,CTR SOLID STATE ELECTR RES,TEMPE,AZ 85287
关键词
D O I
10.1109/EDL.1986.26334
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:172 / 174
页数:3
相关论文
共 15 条
[1]   OXYGEN PRECIPITATION EFFECTS ON SI-N+-P JUNCTION LEAKAGE BEHAVIOR [J].
CHAKRAVARTI, SN ;
GARBARINO, PL ;
MURTY, K .
APPLIED PHYSICS LETTERS, 1982, 40 (07) :581-583
[2]  
Chan S. S., 1985, MATER RES SOC S P, V46, P281
[3]   INFRARED SPECTROSCOPICAL AND TEM INVESTIGATIONS OF OXYGEN PRECIPITATION IN SILICON-CRYSTALS WITH MEDIUM AND HIGH OXYGEN CONCENTRATIONS [J].
GAWORZEWSKI, P ;
HILD, E ;
KIRSCHT, FG ;
VECSERNYES, L .
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1984, 85 (01) :133-147
[4]  
Goetzberger A., 1976, Critical Reviews in Solid State Sciences, V6, P1, DOI 10.1080/10408437608243548
[5]  
GOODMAN AM, 1983, RCA REV, V44, P326
[6]  
HOELZLEIN K, 1984, APPL PHYS A, V34, P155
[7]  
HWANG JS, UNPUB J APPL PHYS
[8]   MEASUREMENT OF INTERFACE DEFECT STATES AT OXIDIZED SILICON SURFACES BY CONSTANT-CAPACITANCE DLTS [J].
JOHNSON, NM ;
BARTELINK, DJ ;
MCVITTIE, JP .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (05) :1407-1411
[9]  
JOHNSON NM, 1978, PHYSICS SIO2 ITS INT, P421
[10]   THERMALLY INDUCED MICRODEFECTS IN CZOCHRALSKI-GROWN SILICON-CRYSTALS [J].
MATSUSHITA, Y .
JOURNAL OF CRYSTAL GROWTH, 1982, 56 (02) :516-525