MICROLENS ARRAYS ETCHED INTO GLASS AND SILICON

被引：37

作者：

SAVANDER, P

机构：

[1] Department of Physics, University of Joensuu, SF-80101 Joensuu

来源：

OPTICS AND LASERS IN ENGINEERING | 1994年 / 20卷 / 02期

基金：

芬兰科学院;

关键词：

Optical instrument lenses;

D O I：

10.1016/0143-8166(94)90020-5

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Microlens arrays fabricated by melting photoresist were transferred by reactive ion etching (RIE) into glass (SiO2) and silicon (Si). By controlling the etching rates of the mask and the substrate material, radii of curvature and focal lengths within a wide range can be achieved. For example, glass lenses with diameter 120 mum and focal lengths between 500 mum and 1500 mum were made. The scaling possibilities of microlens arrays, given the use of RIE, are discussed.

引用

页码：97 / 107

页数：11

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