SPECTROSCOPIC STUDY ON A DISCHARGE PLASMA OF MOCVD SOURCE GASES FOR HIGH-TC SUPERCONDUCTING FILMS

被引：36

作者：

HARIMA, H ^{[1
]}

OHNISHI, H ^{[1
]}

HANAOKA, K ^{[1
]}

TACHIBANA, K ^{[1
]}

KOBAYASHI, M ^{[1
]}

HOSHINOUCHI, S ^{[1
]}

机构：

[1] MITSUBISHI ELECTR CO, MFG DEV LAB, AMAGASAKI, HYOGO 661, JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 1990年 / 29卷 / 10期

关键词：

Ba(DPM)2; Cu(DPM)2; IR absorption; MOCVD; Plasma; Spectroscopy; Superconductor; Thin film; Y(DPM) 3;

D O I：

10.1143/JJAP.29.1932

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Optical emission spectra from a glow-discharge plasma in the vapors of β-diketonate chelates of Ba, Y and Cu element have been measured. They show great changes depending on the temperature of the source-gas oven. In the case of Ba(DPM)2, for example, intensity of the Ba+emission lines increases drastically at above 220°C, when compared to neutral lines. Referring to the data of thermal analysis and IR absorption experiment, this corresponds to the development of decomposition of the source material. The present experiment opens a future possibility of optical diagnostics to determine the optimum gas feeding condition in the preparation of high-Tcsuperconducting films by the MOCVD technique. © 1990 IOP Publishing Ltd.

引用

页码：1932 / 1938

页数：7

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