CHARACTERIZATION OF A TI VACUUM-ARC AND THE STRUCTURE OF DEPOSITED TI AND TIN FILMS

被引：48

作者：

MARTIN, PJ ^{[1
]}

NETTERFIELD, RP ^{[1
]}

MCKENZIE, DR ^{[1
]}

FALCONER, IS ^{[1
]}

PACEY, CG ^{[1
]}

TOMAS, P ^{[1
]}

SAINTY, WG ^{[1
]}

机构：

[1] UNIV SYDNEY, SCH PHYS, SYDNEY, NSW 2070, AUSTRALIA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 1987年 / 5卷 / 01期

关键词：

D O I：

10.1116/1.574132

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：22 / 28

页数：7

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