KRF EXCIMER LASER LITHOGRAPHY FOR HALF-MICRON DEVICES

被引：0
|
作者：
OGAWA, K [1 ]
SASAGO, M [1 ]
ENDO, M [1 ]
NAKAGAWA, H [1 ]
ISHIHARA, T [1 ]
机构：
[1] MATSUSHITA ELECT IND CO LTD, SEMICOND RES CTR, MORIGUCHI, OSAKA 570, JAPAN
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1987年 / 134卷 / 8B期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：C432 / C432
页数：1
相关论文
共 50 条
  • [1] A KRF EXCIMER LASER LITHOGRAPHY FOR HALF MICRON DEVICES
    OGAWA, K
    SASAGO, M
    ENDO, M
    ISHIHARA, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1988, 27 (08): : 1521 - 1525
  • [2] ADVANCED KRF EXCIMER LASER STEPPER FOR HALF MICRON LITHOGRAPHY
    OGAWA, K
    SASAGO, M
    ENDO, M
    NAKAGAWA, H
    TANI, Y
    ISHIHARA, T
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1988, 135 (09) : 2347 - 2352
  • [3] QUARTER MICRON KRF EXCIMER LASER LITHOGRAPHY
    SASAGO, M
    ENDO, M
    TANI, Y
    KOBAYASHI, S
    KOIZUMI, T
    MATSUO, T
    YAMASHITA, K
    NOMURA, N
    IEICE TRANSACTIONS ON ELECTRONICS, 1993, E76C (04) : 582 - 587
  • [4] RECENT PROGRESS IN KRF EXCIMER LASER LITHOGRAPHY
    NAKASE, M
    IEICE TRANSACTIONS ON ELECTRONICS, 1993, E76C (01) : 26 - 31
  • [5] Positive resist for KrF excimer laser lithography
    Park, SJ
    Kim, IH
    Kang, YJ
    Lee, H
    Lee, SH
    Choi, SJ
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2002, 20 (05): : 2108 - 2112
  • [6] Lithography Technology Using a KrF Excimer Laser
    Yamaguchi, A.
    Nakao, S.
    Wakamiya, W.
    Mitsubishi Denki Giho, 71 (03):
  • [7] SUBHALF MICRON LITHOGRAPHY WITH EXCIMER LASER
    TANAKA, Y
    TAKEDA, M
    SAITO, M
    KASUGA, T
    TSUMORI, T
    OPTICAL/LASER MICROLITHOGRAPHY II, 1989, 1088 : 483 - 493
  • [8] ELECTRON-BEAM PROXIMITY PRINTING OF HALF-MICRON DEVICES
    MEISSNER, K
    HAUG, W
    SILVERMAN, S
    SONCHIK, S
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1989, 7 (06): : 1443 - 1447
  • [9] STUDY OF HALF-MICRON PHOTOLITHOGRAPHY BY MEANS OF CONTRAST ENHANCED LITHOGRAPHY PROCESS
    HIRAI, Y
    SASAGO, M
    ENDO, M
    OGAWA, K
    MANO, Y
    ISHIHARA, T
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (01): : 434 - 438
  • [10] NEW TECHNOLOGIES OF KRF EXCIMER-LASER LITHOGRAPHY SYSTEM IN 0.25 MICRON COMPLEX CIRCUIT PATTERNS
    SASAGO, M
    MATSUO, T
    YAMASHITA, K
    ENDO, M
    MATSUOKA, K
    KOIZUMI, T
    KATSUYAMA, A
    NOMURA, N
    IEICE TRANSACTIONS ON ELECTRONICS, 1994, E77C (03) : 416 - 424
12345