SELECTIVELY IMPLANTED OXYGEN ISOLATION TECHNOLOGY (SIO)

被引:1
作者
RATNAM, P
SALAMA, CAT
机构
[1] Univ of Toronto, Dep of Electrical, Engineering, Toronto, Ont, Can, Univ of Toronto, Dep of Electrical Engineering, Toronto, Ont, Can
关键词
D O I
10.1049/el:19850319
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
3
引用
收藏
页码:448 / 449
页数:2
相关论文
共 3 条
[1]  
CHIU KY, 1982, IEEE T ELECTRON DEV, V29, P536, DOI 10.1109/T-ED.1982.20739
[2]  
HUI JCH, 1982, IEEE T ELECTRON DEV, V29, P554
[3]  
Kurosawa K., 1981, International Electron Devices Meeting, P384