IMAGE REVERSAL OF POSITIVE PHOTORESIST - CHARACTERIZATION AND MODELING

被引：14
作者：
KLOSE, H
SIGUSH, R
ARDEN, W
机构：
[1] SIEMENS AG, RES & DEV LABS, TECHNOL GRP, MUNICH, FED REP GER
[2] SIEMENS AG, CENT RES LABS, DEPT MICROELECTR, LITHOG GRP, MUNICH, FED REP GER
来源：
IEEE TRANSACTIONS ON ELECTRON DEVICES | 1985年 / 32卷 / 09期
关键词：
D O I：
10.1109/T-ED.1985.22175
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：1654 / 1661
页数：8
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