ALTERNATING ION PLATING - METHOD OF HIGH-RATE ION VAPOR-DEPOSITION

被引：23

作者：

SCHILLER, S ^{[1
]}

HEISIG, U ^{[1
]}

GOEDICKE, K ^{[1
]}

机构：

[1] FORSCH INST MANFRED VON ARDENNE,ZEPPELIN STR 7,8051 DRESDEN,GER DEM REP

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1975年 / 12卷 / 04期

关键词：

D O I：

10.1116/1.568688

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：858 / 864

页数：7

共 17 条

[1] INFLUENCE OF ION-BOMBARDMENT ON MICROSTRUCTURE OF THICK DEPOSITS PRODUCED BY HIGH RATE PHYSICAL VAPOR-DEPOSITION PROCESSES [J].

BUNSHAH, RF ;

JUNTZ, RS .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1972, 9 (06) :1404-&

[2] EFFECTS OF BIAS VOLTAGE ON PROPERTIES AND STRUCTURE OF SPUTTERED AND ION-PLATED COATINGS [J].

CARMICHAEL, DC .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (04) :639-639

[3]

CARPENTER R, 1971, ELECTR PACK PROD INT, V7, P4

[4]

GOEDICKE K, 1975, THESIS E GERMANY

[5] DEPOSITION OF MULTICOMPONENT PHASES BY ION PLATING [J].

HARKER, HR ;

HILL, RJ .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1972, 9 (06) :1395-&

[6]

KENNEDY KD, 1971, RES DEV, V22, P40

[7] CHARACTERIZATION OF SILVER COATINGS DEPOSITED FROM A HOLLOW-CATHODE SOURCE [J].

MAH, G ;

MCLEOD, PS ;

WILLIAMS, DG .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (04) :663-665

[8]

Mattox D.M., 1964, ELECTROCHEM TECHNOL, V2, P95

[9] FUNDAMENTALS OF ION PLATING [J].

MATTOX, DM .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1973, 10 (01) :47-52

[10] HIGH RATE ION PRODUCTION FOR VACUUM DEPOSITION [J].

MORLEY, JR ;

SMITH, HR .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1972, 9 (06) :1377-&

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