STRESS MEASUREMENT IN SPUTTERED COPPER-FILMS ON FLEXIBLE POLYIMIDE SUBSTRATES

被引：16

作者：

ENTENBERG, A

LINDBERG, V

FLETCHER, K

GATESMAN, A

HORWATH, RS

机构：

[1] ROCHESTER INST TECHNOL,CTR MAT SCI & ENGN,ROCHESTER,NY 14623

[2] IBM CORP,DIV SYST TECHNOL,ENDICOTT,NY 13760

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1987年 / 5卷 / 06期

关键词：

D O I：

10.1116/1.574198

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：3373 / 3377

页数：5

共 19 条

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[2] EFFECTS OF ARGON PRESSURE AND SUBSTRATE-TEMPERATURE ON THE STRUCTURE AND PROPERTIES OF SPUTTERED COPPER-FILMS [J].

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HARDING, GL .

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[3]

GELDERMANS P, 1984, POLYIMIDES SYNTHESIS, V2, P695

[4]

GRAY DE, 1972, AM I PHYSICS HDB

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[6] INTERNAL-STRESSES IN SPUTTERED CHROMIUM [J].

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THORNTON, JA .

THIN SOLID FILMS, 1977, 40 (JAN) :355-363

[7] COMPRESSIVE STRESS TRANSITION IN AL, V, ZR, NB AND W METAL-FILMS SPUTTERED AT LOW WORKING PRESSURES [J].

HOFFMAN, DW ;

THORNTON, JA .

THIN SOLID FILMS, 1977, 45 (02) :387-396

[8] INTERNAL-STRESSES IN CR, MO, TA, AND PT FILMS DEPOSITED BY SPUTTERING FROM A PLANAR MAGNETRON SOURCE [J].

HOFFMAN, DW ;

THORNTON, JA .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (03) :355-358

[9] EFFECTS OF SUBSTRATE ORIENTATION AND ROTATION ON INTERNAL-STRESSES IN SPUTTERED METAL-FILMS [J].

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THORNTON, JA .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02) :134-137

[10]

Hoffman R. W., 1966, PHYS THIN FILMS, VVol. 3, pp. 211

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