ION-BEAM EXPOSURE APPARATUS USING A LIQUID-METAL SOURCE

被引：26

作者：

KOMURO, M

机构：

来源：

THIN SOLID FILMS | 1982年 / 92卷 / 1-2期

关键词：

D O I：

10.1016/0040-6090(82)90198-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：155 / 164

页数：10

共 11 条

[1] MECHANISM OF LIQUID-METAL ELECTRON AND ION SOURCES [J].

GOMER, R .

APPLIED PHYSICS, 1979, 19 (04) :365-375

[2] FIELD-EMISSION LIQUID-METAL ION-SOURCE AND TRIODE ION GUN [J].

KOMURO, M ;

KAWAKATSU, H .

JOURNAL OF APPLIED PHYSICS, 1981, 52 (04) :2642-2645

[3]

KOMURO M, 1980, 4TH P S ION SOURC IO, P81

[4]

KOMURO M, 1980, 27TH P IFES TOK, P189

[5]

LOEFFLER KH, 1969, Z ANGEW PHYSIK, V27, P145

[6]

Muller E W, 1969, FIELD ION MICROSCOPY

[7] FINE-FOCUS ION-BEAMS WITH FIELD-IONIZATION [J].

ORLOFF, J ;

SWANSON, LW .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (03) :845-848

[8] HIGH-INTENSITY SCANNING ION PROBE WITH SUBMICROMETER SPOT SIZE [J].

SELIGER, RL ;

WARD, JW ;

WANG, V ;

KUBENA, RL .

APPLIED PHYSICS LETTERS, 1979, 34 (05) :310-312

[9] ENERGY-DISTRIBUTION OF EHD EMITTED GOLD IONS [J].

SUDRAUD, P ;

COLLIEX, C ;

VANDEWALLE, J .

JOURNAL DE PHYSIQUE LETTRES, 1979, 40 (09) :L207-L211

[10]

SWANSON LW, 1979, SCANNING ELECTRON MI, V1, P45

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